Electrically Pumped Ultraviolet Lasing from Zno in Metal-Insulator-Semi Devices

Kewei Wu,Ping Ding,Yangfan Lu,Xinhua Pan,Haiping He,Jingyun Huang,Binghui Zhao,Cong Chen,Lingxiang Chen,Zhizhen Ye
DOI: https://doi.org/10.1007/s00339-013-7710-7
2013-01-01
Abstract:Electrically pumped ultraviolet random lasing was achieved in metal-insulator-semiconductor (MIS) diodes based on ZnO films at room temperature. The ZnO films were grown by plasma assisted molecular beam epitaxy. Two different kinds of insulator layers, SiO x (0<x≤2) and AlO x (0<x≤1.5) were deposited by electron beam evaporation. X-ray diffraction experiments found these oxide layers were amorphous (or microcrystals), and X-ray photoelectron spectroscopy confirmed the Si and Al were fully oxidized. Compared with devices using SiO x as the insulator layer, diodes with evaporated AlO x layers showed a lower working threshold forward current (∼20 mA to ∼26 mA) and higher emission intensity. Periodic features indicating formation of closed-loop paths were deduced by the power Fourier transform of electroluminescence spectra. The cavity length of both devices increased as forward currents increased, while a larger cavity length was always obtained in the AlO x -involved device under the same working current. The improved performance was attributed to larger hole amount in AlO x layers. These results revealed that evaporated AlO x can serve as good electron blocking and hole supplying layers for hetero-structures.
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