HIGH RESOLUTION SILICA IMPRINTING MOLD FABRICATED FROM A PHOTOCURABLE PERHYDROPOLYSILAZANE

Fang Qingling,Li Xiaodong,Li Yihe,Dong-Pyo Kim

DOI: https://doi.org/10.3724/sp.j.1105.2012.11062

2012-01-01

Acta Polymerica Sinica

Abstract:Towards the low-cost fabrication of a hard imprinting mold with micro-and nanostructures,a novel photocurable inorganic polymer was modified from perhydropolysilazane(PHPS) by grafting with 2-isocyanatoethyl methacrylate(ICMA) in this paper.The as-modified product was characterized by the methods of FTIR,1H-NMR,13C-NMR and 2D-1H-1H-NMR(COSY).The new peaks at δ=3.2~3.8 on1H-NMR spectra of the product were assigned to be the NH—CH2 group,and δ=152~158 on 13C-NMR spectra was assigned to be the CO—NH group.In the FTIR spectra,the absorbing peaks at 2153 and 1363 cm-1(N-C-O),1117 cm-1(—C—N-C) of PHPS were obviously consumed after chemical modification,and the new peaks at 1690,1530 and 1314 cm-1(CO—NH)were appeared.Combined with the COSY analysis,it was concluded that the UV sensitive methacrylyate group was successfully grafted to PHPS,and methacrylated perhydropolysilazane(MPHPS) was used to name the as-modified product here.MPHPS was then used to fabricate the micro-and nanostructures via UV imprinting lithography using a fluoropolymer(FP) mold with microstructures,adding a pressure ranged in 0.1~0.4 MPa.The efficiency of the pattern transfer from FP mold was increased by the pressure increasing,and the thoroughly pattern copy was realized at 0.23 MPa.Besides,nanostructures with 90 nm,70 nm feature sizes were obtained at the pressure of 0.4 MPa.Then the as-prepared micro-and nanostructures were converted into Si—O inorganic phase by a followed hydrolysis treatment.The converted product was concluded to be a composition of SiO1.5 from XPS depth profile.The final obtained mold was optical transparent,and with a hardness of 4.5×103 MPa and a elastic modulus of 115×103 MPa.