Field Emission Characteristics of Graphene Film on Nickel Substrate

Yu Zhang,Qionghui Zhou,S. Z. Deng,Jun Chen,N. S. Xu
DOI: https://doi.org/10.1109/ivnc.2012.6316849
2012-01-01
Abstract:Graphene film on nickel substrate is synthesized by using thermal chemical vapor deposition method. The field emission characteristics of the graphene film are measured. The turn-on field of 6.4 V/μm and the emission current as large as 1.5 mA is achieved. The current stability of graphene film is very good with fluctuation less than 2.4%. The emission site is found from the protrusion of the graphene on the surface.
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