Synthesis and Application of Photosensitive Novolac Epoxy Acrylate Resins

Gao Ming,Deng Guangwan,Ren Biye,Tong Zhen
DOI: https://doi.org/10.3969/j.issn.0253-4312.2009.05.009
2009-01-01
Abstract:Two kinds of novolac epoxy acrylates were synthesized by the reaction of two kinds of novolac epoxy F-51,JF-41 with different softening point and acrylic acid,respectively.The two novolac epoxy acrylates were further modified by maleic anhydride to prepare a UV curable photosensitive resins.The effects of temperature and the type and mass ratio of catalyst on reaction were discussed.The structure of resins was characterized by IR spectra.The photoimage electron solder resist ant inks were prepared by using these resins and then cured for 40 s by UV and cured for 30 min by heating at 140 ℃ again.The resulting UV cured films could be readily and fast developed using weak alkali solution.The final cured films exhibit good properties: hardness ≥4H,adhesion grade 1,decomposition temperature over 300 ℃,and good solvent resistance.
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