Dopant Segregation and Giant Magnetoresistance in Manganese-Doped Germanium

A. P. Li,C. Zeng,K. van Benthem,M. F. Chisholm,J. Shen,S. V. S. Nageswara Rao,S. K. Dixit,L. C. Feldman,A. G. Petukhov,M. Foygel,H. H. Weitering
DOI: https://doi.org/10.1103/physrevb.75.201201
2007-01-01
Abstract:Dopant segregation in a ${\mathrm{Mn}}_{\mathrm{x}}{\mathrm{Ge}}_{1\ensuremath{-}x}$ dilute magnetic semiconductor leads to a remarkable self-assembly of Mn-rich nanocolumns, embedded in a fully compensated Ge matrix. Samples grown at $80\phantom{\rule{0.2em}{0ex}}\ifmmode^\circ\else\textdegree\fi{}\mathrm{C}$ display a giant positive magnetoresistance that correlates directly with the distribution of magnetic impurities. Annealing at $200\phantom{\rule{0.2em}{0ex}}\ifmmode^\circ\else\textdegree\fi{}\mathrm{C}$ increases Mn substitution in the host matrix above the threshold for the insulator-metal transition, while maintaining the columnar morphology, and results in global ferromagnetism with conventional negative magnetoresistance. The qualitative features of magnetism and transport in this nanophase material are thus extremely sensitive to the precise location and distribution of the magnetic dopants.
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