RF p -GaN HEMT with 0.9-dB Noise Figure and 12.8-dB Associated Gain for LNA Applications
Junmin Zhou,Haowen Guo,Haitao Du,Yu Zhang,Haolan Qu,Wei Huang,Jianjun Zhou,Zhiqiang Xiao,Xinbo Zou
DOI: https://doi.org/10.1109/led.2023.3294696
IF: 4.8157
2023-01-01
IEEE Electron Device Letters
Abstract:Low-noise amplification performance of an enhancement-mode p- GaN gate high electron mobility transistor (HEMT) is thoroughly investigated. Featuring a tungsten (W) gate metal and CMOS-compatible metal contacts to source/drain terminals, the device exhibits a positive threshold voltage of 2.7 V. Low gate leakage current density ( $\text{I}_{\text {G}}{)}$ of 3.8 pA/mm and 16.3 nA/mm are extracted in pinch-off region and on-state region, respectively. The device delivers an input third-order interception point (IIP3) of 15.8 dBm at 2 GHz, together with good immunity of linearity characteristics against frequency change. A minimum noise figure ( $NF_{\text {min}}{)}$ of 0.9 dB with an associated gain ( $\text{G}_{\text {a}}{)}$ of 12.8 dB are achieved at a working frequency of 2 GHz. Furthermore, an examination of the bias and frequency effects on NFmin and $\text{G}_{\text {a}}$ reveals NFmin of 0.65 dB and $\text{G}_{\text {a}}$ of 18.3 dB at 1 GHz. This work paves a solid path for the utilization of ${p}$ -GaN HEMT for low noise amplifier applications.
engineering, electrical & electronic