Effect of P–n Junction Location on Characteristics of InGaN/GaN Multiple-Quantum-Well Light-Emitting Diodes

Lai Wang,Hongtao Li,Guangyi Xi,Yang Jiang,Wei Zhao,Yanjun Han,Yi Luo
DOI: https://doi.org/10.1143/jjap.47.7101
IF: 1.5
2008-01-01
Japanese Journal of Applied Physics
Abstract:InGaN/GaN multiple-quantum-well (MQW) light-emitting diodes (LEDs) with different p–n junction locations have been investigated by current–voltage (I–V), electroluminescence (EL), and capacitance–voltage (C–V) measurements. At 20 mA injection current, the operating voltage of the LEDs decreases by 0.15 V, the EL intensity increases by 14% and the EL wavelength shifts from 465 to 455 nm owing to the shortening of the distance between n-InGaN/GaN MQW and p-type materials. C–V measurements indicate that only the quantum well immediately adjacent to the p-type region still remains inside the depletion region when LEDs are forward biased. Analysis reveals that the characteristics of the LEDs can be improved by optimizing the p–n junction location through the improvement of the holes' tunneling injection and weakening of the piezoelectric field in InGaN quantum wells.
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