Focused Ion Beam Lithography of Multiperiod Gratings for A Wavelength-Division-Multiplexed Transmitter Laser Array
IM Templeton,M Fallahi,LE Erickson,F Chatenoud,ES Koteles,HG Champion,JJ He,R Barber
DOI: https://doi.org/10.1116/1.588252
1995-01-01
Abstract:Wavelength-division multiplexing with closely spaced multiple wavelengths is of great interest for high-capacity data transmission. One major and very critical requirement of such a system is the fabrication of a laser array with very small wavelength separations (∼2 nm). In this paper, the design, fabrication, and performance of an integrated eight-channel system is described. Focused ion beam lithography, with the beam deflection sensitivity modified from its calibrated value, is used to write the critical stepped-period distributed-Bragg-reflector gratings required to provide the tightly controlled multiple laser frequencies. The outputs of the lasers are combined via curved waveguides into a single optical output.