Abstract:Abstract Herein, we fabricated CdSe-based thin-film transistors (TFTs) employing two different hybrid dielectric gates, SiO 2 –poly(vinylphenol) and Al 2 O 3 –3-glycidoxypropyltrimethoxysilane–polymethylmethacrylate. These organic–inorganic hybrid dielectric layers were processed by the sol-gel method at low temperatures (<200 °C), and the CdSe semiconductor layer was deposited by R.F sputtering at room temperature. The chemical and physical properties of the hybrid thin films were thoroughly evaluated by Fourier transform infrared spectroscopy, field emission scanning electron microscope, atomic force microscopy and surface energy analysis. The results have shown an adequate interaction between both organic and inorganic phases in the hybrid material and the obtained hybrid thin films are very homogeneous with low surface roughness. Further, the dielectric properties of these hybrid thin films showed salient features with similar leakage currents for both dielectrics of the order of 10 −6 A cm −2 , and dielectric constants of 7 and 11 at 1 kHz for the silica and alumina based dielectrics, respectively. The higher dielectric constant of the alumina hybrid dielectric is associated to excessive oxygen defects such as hydroxyl groups (OH) and oxygen vacancies (V o ), which produce high dielectric loss through hopping relaxation. To investigate the feasibility of these two hybrids as dielectric gate layers we constructed TFTs with CdSe as active channel layer. Among these, TFTs fabricated with silica hybrid dielectric showed the best performance with a current off/on ratio of 10 4 , threshold voltage of 1.1 V and mobility of 22.2 cm 2 V −1 s −1 . Meanwhile, the TFT device with alumina hybrid as dielectric gate layer exhibited a diminished electrical performance in terms of lower mobilities, which is mostly related to the defects at the dielectric/semiconductor interface. These defects manifested as well in the capacitance measurements of the alumina hybrid dielectric and have a strong influence on the device mobility since the charge carriers traps restrict the electrical transport in the semiconductor channel.

Influence of precursors gases on LPCVD TFT's characteristics

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Advanced atmospheric pressure CVD of a-Si:H using pure and cyclooctane-diluted trisilane as precursor

Comparative study of large grains and high-performance TFTs in low-temperature crystallized LPCVD and APCVD amorphous silicon films

Influence of C_2H_4 on the Properties of Amorphous Silicon Film Grown by Chemical Vapor Deposition

The Effect of Relatively Low Hydrogen Dilution on the Properties of Carbon-Rich Hydrogenated Amorphous Silicon Carbide Films

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Atomic Layer Deposition of Carbon Doped Silicon Oxide by Precursor Design and Process Tuning

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Characterization of in Situ Phosphorus‐Doped Polycrystalline Silicon Films Grown by Disilane‐Based Low‐Pressure Chemical Vapor Deposition

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Plasma-enhanced atomic layer deposition of silicon nitride thin films with different substrate biasing using Diiodosilane precursor

An overview of the deposition chemistry and the properties of in situ doped polysilicon prepared by low pressure chemical vapour deposition

Interfacial electrical and chemical properties of deposited SiO2 layers in lateral implanted 4H-SiC MOSFETs subjected to different nitridations

High Rate Deposition of Stable Hydrogenated Amorphous Silicon in Transition from Amorphous to Microcrystalline Silicon

Influence of Phosphorus Doping in the Active Layer with Deposition Time and Gas Flow Rate in a-Si:H Thin Film Transistor

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Low-Temperature Materials And Thin Film Transistors For Flexible Electronics

Chemical Vapor Deposition of Undoped and In-Situ Boron- and Arsenic-Doped Epitaxial and Polycrystalline Silicon Films Grown Using Silane at Reduced Pressure

Pulsed Excimer Laser Crystallization and Doping for the Fabrication of Poly-Si and -SiGe TFTs

Electrical response of CdSe-based thin film transistors with different hybrid dielectric gates