Abstract:Direct current plasma enhanced chemical vapor deposition (CVD) was employed to create polycrystalline diamond films from CH4/H2gaseous mixture at 98 mbar pressure and various substrate temperatures between 720 °C and 960 °C. The Si chips with patterns of periodic masked and open seeded zones were used as substrates. The mask free seeded areas evolved into polycrystalline diamond films after CVD process. The diamond crystallites of the films featured single crystal ordering individually with distinct cubic (100) or octahedral (111) facets on the film surfaces. Notably, specific growth conditions were determined for obtaining diamond films composed of the crystallites of nanometre and micrometre scale. These conditions are differing from those observed for non-pattern-prepared Si substrates. The nano-crystalline diamonds emerged within the 4.5-5 A current range, with growth conditions involving 3% CH4/H2mixture at 98 mbar. The micro-crystalline diamonds (MCDs) predominantly characterized by well-developed rectangular (100) crystal faces on the film surface were successfully grown with current settings of 5.5-6 A, under 3% CH4/H2mixture at 98 mbar. Furthermore, MCDs characterized by entirely crystalline (111) diamond faces forming CVD film surface were attained within a growth parameter range of 4.5-5.8 A, employing 3% CH4/H2mixture for certain samples, or alternatively, utilizing 5 A with a 1.5% CH4/H2mixture for others. Upon thorough evaluation, it was established that SiO2, TiO2, and Cr masks are well-suited materials for the planar patterning of both nano- and micro-crystalline diamond films, and the bottom-up approach can pave the way for the production of diamond planar structures through CVD, facilitated by electron beam lithography (EBL).

Patterning of Diamond Microstructures on Si Substrate by Bulk and Surface Micromachining

Precise Patterning of Diamond Films for MEMS Application

Fabrication of Diamond Microstructures by Using Dry and Wet Etching Methods

Seed-Free Growth of Diamond Patterns on Silicon Predefined by Femtosecond Laser Direct Writing

Nano- and micro-crystalline diamond film structuring with electron beam lithography mask

Seed-Free Growth of Diamond Patterns on Femtosecond Laser Processed Silicon Substrates

Selective Deposition of Diamond Films on Insulators by Selective Seeding with A Double-Layer Mask

Microcontact Printing of Monodiamond Nanoparticles: an Effective Route to Patterned Diamond Structure Fabrication

Patterning of Diamond Films by Rie and Its Mems Applications

Diamond etching with near-zero micromasking

Enhanced Nucleation and Growth of Diamond Film on Si by CVD Using a Chemical Precursor

Micropatterning of synthetic diamond by metal contact etching with Ti powder

Approach of selective nucleation and epitaxy of diamond films on Si(100)

Nucleation growth mechanism of diamond on 4H-SiC substrate by microwave plasma chemical vapor deposition

Nucleation and Growth of Cvd Diamond Films on Smooth Si Substrate Pretreated by Nanodiamond Powders

Selected-Area Diamond Deposition On Si Substrates Pretreated In Different Ways

Progress of Diamond Substrate Development

A Study of Interface Structure Between Diamond Film and Silicon Substrate

Microcontact printing fabrication of diamond MEMS cantilevers on silicon substrate

Precision Machining of Silicon Carbide with Diamond Micro Tool Array (DMTA)

High-precision and high-speed etching of diamond surfaces using Fe–Ni alloy catalyzed H–O plasma etching