Monte Carlo simulation and study of thin film growth on different crystal substrate

TAN Tian-Ya,LI Chun-Mei,SU Yu,ZHANG Jing,WU Wei,GUO Yong-Xin

DOI: https://doi.org/10.3969/j.issn.1000-0364.2009.02.026

2009-01-01

Journal of Atomic and Molecular Physics

Abstract:The effect of the substrate temperature and the rest energy of incident particles on the island morphology and size at the early stage of thin film growth on tetragonal and hexagonal substrates are studied by Monte-Carlo simulation.In our model,three processes are considered.:particle deposition,adatom diffusion and adatom reevaporation.The result shows that the lattice structure of the substrate has an obvious effect on the thin film growth.With the rest energy of the incident particles of zero,the thin film growth on the tetragonal substrate has been taken on condensation at the temperature of 300 K. With increase of temperature and rest energy of incident particles,the number of islands becomes less and the mean size of each island is increased.But for the hexagonal substrate,the island growth transits from sporadic to fractal shape with temperature increasing from 300 K to 350 K when the rest energy of the incident particles equals zero;the thin film growth changes from sporadic to fractal shape with rest energy of the incident particles increasing from zero to 0.05 eV when the temperature of the substrate is 300K.