Substitutional doping at S site of MoS2/G heterostructure: The influence on voltage-current and electronic characteristics
Zhenguo Zhuo,Fei Yang,Junnan Han,Xincheng Cao,Yue Tao,Le Zhang,Wenjin Liu,Ziyue Zhu,Yuehua Dai
DOI: https://doi.org/10.1016/j.spmi.2021.106978
IF: 3.22
2021-08-01
Superlattices and Microstructures
Abstract:<p>The effect of substitutional doping at S site on the electronic properties of MoS<sub>2</sub>/Graphene (MoS<sub>2</sub>/G) was studied by First-principles calculations. Through the analysis on the energy band and density of states of MoS<sub>2</sub>/Graphene, it was found that the S vacancy in MoS<sub>2</sub> monolayer will cause the Dirac point shifted, and produce the defect energy levels at the Dirac point, which will hinder the carrier transmission. Periods II-IV elements were doped at the S vacancy to improve the electronic properties and performance of MoS<sub>2</sub>/G. The calculated results show that the charge transfer of MoS<sub>2</sub>/G was greatly enhanced by the doping of N, P and As atoms. The current-voltage characteristic of N, P and As-doped G/MoS<sub>2</sub>/MoS<sub>2</sub>/G structure has higher drive-current and stable OFF-state current which can reduce device current consumption. For O-doped and Se-doped MoS<sub>2</sub>/G heterostructures, there is no impurity level introduced, and the Schottky barrier height increase (decrease) with the increase (decrease) of the biaxial strain, meantime the p-type Schottky contact, n-type Schottky contact and Ohmic contact characteristic can be converted mutually by adjusting biaxial strain or vertical external force. Our findings will be of great guiding significance for the designing of interface devices and explorations on nano-electronics.</p>
physics, condensed matter