Pulsed Laser Deposition of Nanocrystalline Znse : N Thin Films

N Xu,YC Du,FM Li,BH Boo
DOI: https://doi.org/10.1088/0268-1242/18/4/318
IF: 2.048
2003-01-01
Semiconductor Science and Technology
Abstract:We have grown nanocrystalline ZnSe thin films on GaAs(100) substrates by pulsed laser deposition (PLD) using KrF excimer laser. Atomic force microscopy (AFM) shows that the ZnSe thin films grown on GaAs(100) at 10(-) torr are flat and dense and composed of crystallites with particle size of less than 100 nm. X-ray diffraction (XRD) results indicated that this ZnSe thin film are of (100) crystalline orientation and the averge size of crystallites is about 25 nm. X-ray photoelectron spectroscopy (XPS) indicates that the as-deposited thin films contain 7% N and below 3% [O], and nitrogen with N-Zn, N-N or N-O bondings are respectively 55% and 45% of total contained nitrogen. Photoluminescence measurements show an donor-to-acceptor pair (DAP) recombination emission with a blue shift with respect to bulk ZnSe, which reveal the activation of [N] atoms as shallow acceptors in nanocrystalline ZnSe.
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