Abstract:Zinc oxide is a multifunctional material with a direct band gap of 3.37 eV and a high exciton binding energy of 60 meV. It also havs piezo- and pyro-electric properties [ 1 ]. It is therefore promising for applications in optics, optoelectronics, electromechanics and photonics. The routinely used physical vapor deposition (PVD) methods [ 2 ] for ZnO-based thin film growth usually lead to polycrystalline nature and non-uniform composition distribution in the thin film. Post-annealing process can improve the crystallinity and hence the electrical properties, but it may not suitable for applications on flexible substrates. By contrast, the chemical bath deposition [ 3 ] (CBD) is a low-cost and straightforward process for large-area fabrication of ZnO thin film growth. In order to increase the texture, and hence the quality, of the ZnO thin film, we modify the surface energy of the substrate by depositing two kinds of self-assembled monolayers with different hydrophilic properties: one is the methyl end group and the other is amino end group. We find that highly (0001) textured ZnO thin films can be grown on the substrate that is ended with the methyl group. Using such surface modification approach, a straightforward method to deposit ZnO thin films can be realized on arbitrary flexible substrates. In this work, we use the convergent beam electron diffraction (CBED) and electron energy loss spectroscopy (EELS) techniques to study the micro-structure and chemical properties of the ZnO layer. The relations between the microstructure and the optical property will be discussed.

Synchrotron Radiation Assistant MOCVD Deposition of ZnO Films on Si Substrate

Fabrication and Characterization of Y2O3 Stabilized ZrO2 Films Deposited with Aerosol-Assisted MOCVD

Preparation and Photoluminescence of ZnO with Nanostructure by Hollow-Cathode Discharge

Crystal Growth of Undoped ZnO Films on Si Substrates under Different Sputtering Conditions

Atomic layer deposition of ZnO on thermal SiO 2 and Si surfaces using N 2-diluted diethylzinc and H 2O 2 precursors

Structural and Optical Characterizations of ZnO Films Grown by Reactive Electron Beam Evaporation

Low-Temperature Epitaxy Of Zno Films On Si(001) And Silica By Reactive E-Beam Evaporation

Epitaxial Growth Of Zno On Gan/Sapphire Substrate By Radio-Frequency Magnetron Sputtering

Low-temperature epitaxy of ZnO films on Si(0 0 1) and silica by reactive e-beam evaporation

Growth Parameters and Substrate Treatment for the MOCVD Growth of ZnO

Preparation and characterization of high-quality ZnO film on silicon substrate by DC reactive magnetron sputtering

Preparation and Photoluminescence of Nanocrystalline Si-Rich Silicon Oxide Films by Pecvd

Comparisons of Structural and Optical Properties of ZnO Films Grown on Sapphire and Si(001)

Influence of Substrates in ZnO Devices on the Surface Plasmon Enhanced Light Emission

Characterizations of Cubic ZnMgO Films Grown on Si(111) at Low Substrate Temperature

Sputtering Deposited Ternary Zn1−xCdxO Crystal Films on Si(111) Substrates

B23-O-15 Van Der Waals Epitaxial Growth of Highly-textured ZnO Thin Film on Surface-modified Silicon Substrates by Chemical Bath Deposition

Mocvd Growth and Properties of Zno Films Using Dimethylzinc and Oxygen

Controlled Growth of ZnO Films on Si Substrate and N-doping Behavior

Zno Thin Film Grown on Silicon by Metal-Organic Chemical Vapor Deposition

X-ray Photoelectron Spectroscopy Study of ZnO Films Grown by Metal-Organic Chemical Vapor Deposition