Growths of InAs/GaAs and InAs/In x Ga 1- x As/GaAs nanowire heterostructures

ye xian,huang hui,ren xiaomin,guo jingwei,huang yongqing,wang qi,zhang xia
DOI: https://doi.org/10.7498/aps.60.036103
IF: 0.906
2011-01-01
Acta Physica Sinica
Abstract:InAs/GaAs and InAs/In-x Ga1-x As/GaAs nanowire heterostructures are grown by metal organic chemical vapor deposition via Au-assistant vapor-liquid-solid mechanism. We find that the InAs nanowires grow directly on GaAs nanowires in a random way, or they grow along the sidewall of the GaAs nanowires, and thet InAs nanowires grow vertically on GaAs nanowires by using an In-x Ga1-x As (0 <= x <= 1) buffer segment. It can be concluded that the influences of crystal lattice mismatch and difference in interfacial energy can be eliminated by inserting a ternary compound semiconductor buffer segment, thereby improving the crystal quality and the capability to control the growth of nanowire heterostructure.
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