Growth and Characterization of GaAs/InxGa1−xAs/GaAs Axial Nanowire Heterostructures with Symmetrical Heterointerfaces

Lu Xiao-Long,Zhang Xia,Liu Xiao-Long,Yan Xin,Cui Jian-Gong,Li Jun-Shuai,Huang Yong-Qing,Ren Xiao-Min
DOI: https://doi.org/10.1088/1674-1056/22/6/066101
2013-01-01
Chinese Physics B
Abstract:We report on the Au-assisted vapour-liquid-solid (VLS) growth of GaAs/InxGa1-xAs/GaAs (0.2 <= x <= 1) axial double-heterostructure nanowires on GaAs (111) B substrates via the metal-organic chemical vapor deposition (MOCVD) technique. The influence of the indium (In) content in an Au particle on the morphology of nanowires is investigated systematically. A short period of pre-introduced In precursor before the growth of InxGa1-xAs segment, coupled with a group III precursor interruption, is conducive to obtaining symmetrical heterointerfaces as well as the desired In/Ga ratio in the InxGa1-xAs section. The nanowire morphology, such as kinking and tapering, are thought to be related to the In composition in the catalyst alloy as well as the VLS growth mechanism.
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