A 3D Resistive Switch Memory with Stackable 1txr Cell

张佶,金钢,吴雨欣,陈怡,林殷茵
DOI: https://doi.org/10.15943/j.cnki.fdxb-jns.2011.04.005
2011-01-01
Abstract:A novel 3D Resistive Switch Memory concept adopting stackable multi-layer 1TxR memory cell structure for future high density application is proposed.The access transistor fabricated on the top of silicon wafer is shared by several resistors.Resistors are stacked between different metallic layers to form 3D structure.For an 8-layer stacked metallic 1TxR(x=64) as an example,the density is over 280% higher than that of the conventional single layer 1T1R structure.Corresponding operation algorithm is proposed to inhibit effectively mis-write and mis-read caused by leakage current and reduce power consumption.
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