Abstract:When light hits the interface between media characterized by different refractive indices, a fraction is reflected: see Figure 1(a). This imposes severe limits on many optoelectronic devices such as solar cells1 and LEDs.2 A range of techniques to reduce reflection have been proposed and developed. For example, a quarter-wavelength transparent layer is typically used as an antireflection coating in solar cells. However, this technique only works for specific wavelengths. Since solar energy covers a wide range of wavelengths, a broadband method is favored. With graded refractive-index layers, light only experiences a gradual change of the refractive index instead of hitting a sharp interface—see Figure 1(c)—and reflection can be greatly reduced for a large range of wavelengths and angles of incidence. Several techniques have been developed to fabricate these layers.3, 4 However, many involve complicated processes or work only for certain materials. We have developed a simple, low-temperature, integratedcircuit-compatible fabrication process. To date, it has thus far only been demonstrated on crystalline5 and hydrogenated amorphous silicon (a-Si:H),6 but it can in principle be applied to other materials as well. A monolayer of silica nanoparticles is first formed on the surface of a sample with an amorphoussilicon thin film on top: see Figures 1(d) and 1(e). The sample is then placed into the reactive-ion etcher (RIE), with the nanoparticles serving as a mask for etching. Either nanowire or nanocone arrays—Figures 1(f) and 1(g), respectively—can be obtained, depending on etching conditions. We used three samples to evaluate the antireflection effect (see Figure 2). A 1μm-thick a-Si:H thin film was deposited onto each, while a monolayer of silica nanoparticles was preformed on the second and third samples. After RIE etching, nanowire and nanocone arrays were formed on the second and third samples, respectively. The thin-film sample had a highly reflective, Figure 1. Effective refractive-index profiles of the interface between air and (a) hydrogenated amorphous-silicon (a-Si:H) thin film, (b) 600nm a-Si:H nanowire (NW) arrays, and (c) 600nm a-Si:H nanocone (NC) arrays. (d)–(g) Schematic illustrations of 1μm-thick a-Si:H on indium tin oxide (ITO)-coated glass substrate, a monolayer of silica (SiO2) nanoparticles on top of a-Si:H thin film, and arrays of NWs and NCs.

Nanowires Array Designed by Means of Two-Dimension Closed-Form Solution for Antireflection

Ordered 3D ThinShell Nanolattice Materials with NearUnity Refractive Indices

Design and analysis of one-dimensional nanostructure on amorphous silicon solar cell for surface reflectance reduction

Wide-angle Broadband Antireflection with Nano-taper Hydrated Alumina Film

Endface reflectivities of optical nanowires.

Research On Surface Anti-Reflection Properties Of Nanowire Array Structure Based On Silicon Solar Cells

Simulation and analysis of the optical performance of silicon nanowire arrays

Fabrication of Large Area Subwavelength Antireflection Structures on Si Using Trilayer Resist Nanoimprint Lithography and Liftoff

Analysis and fabrication of the two-dimensional periodic anti-reflective subwavelength structure

Numerical modelling of Zinc Oxide nanowire anti reflective coatings

Design and Simulation of Temperature-Insensitive Arrayed Waveguide Gratings Based on Silicon Nanowires

Design and fabrication of wafer-scale highly uniform silicon nanowire arrays by metal-assisted chemical etching for antireflection films

Broadband High-Performance Infrared Antireflection Nanowires Facilely Grown on Ultrafast Laser Structured Cu Surface.

Nanocones As Antireflection Coating

Anti-reflection Properties of Spherical Top Nanowire Arrays for Solar Cell Applications

Polarization Dispersion Compensated Arrayed Waveguide Gratings Design Based on Silicon Nanowires

Hexagonal Arrays Of Round-Head Silicon Nanopillars For Surface Anti-Reflection Applications

Durable Broadband and Omnidirectional Ultra-antireflective Surfaces

Broadband and Wide-Angle Antireflection Realized by Multireflection Effect in a Micro-∧-shape Array.

Double grating antireflection nanostructure based on nano-cone

Improved antireflection properties and optimized structure for passivation of well-separated, vertical silicon nanowire arrays for solar cell applications