Development of high Al content structural Ⅲ nitrides and their applications in deep UV-LED

Chen Hang-Yang,Liu Da-Yi,Li Jin-Chai,Lin Wei,Yang Wei-Huang,Zhuang Qin-Qin,Zhang Bin-Bin,Yang Wen-Cao,Cai Duan-Jun,Li Shu-Ping,Kang Jun-Yong
2013-01-01
Abstract:Along with the extensive investigations and growth technology maturation on high Ga content III-nitrides,researchers have moved their focus onto high Al content III-nitrides.Given a wider band gap up to 6.2 eV at room temperature,covering UV-light area as short as 210 nm,as well as other advantages of III-nitrides,high Al content III-nitrides are ideal materials for the fabrication of UV-light emitting devices.At present,there are certain challenges in the fabrication of UV-light emitting devices with high internal quantum efficiency,carrier injection efficiency and light-extraction efficiency due to the low quality materials.In this work,the progress on growth kinetics of high Al content III-nitrides in recent years has been reviewed comprehensively,and the corresponding researches in quantum structure design,internal electric field modification and crystalline field modification have been overviewed and analyzed.This review is expected to be informative for the fabrication of deep UV-LEDs.
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