Exposure Properties and Application of Acrylate-Based Dry Film Photoresists

Qin Jian,Liu Zewen,Zhong Yan,Wang Taihong
DOI: https://doi.org/10.3969/j.issn.1671-4776.2011.07.009
2011-01-01
Abstract:Exposure and development characterization of a novel photopolymer dry film photoresist(DFP)based on acrylate were investigated,and the experiment of the micro-channel fabricated on-chip with DFP was carried out.The lamination of the 50 μm-thickness photoresist film was realized on 4 inch silicon substrates to solve the lamination problem of the dry film photoresist on the silicon substrate.The exposure properties of the DFP were researched by the exposure time dependent on exposure dose control method,and its developing property was investigated with control of concentration gradient.The developing properties of DFP were investigated by the different developer concentrations to obtain the optimization results.The micro-channel was fabricated by DFP system and the micro-channel structures with the steep side wall were obtained.The experiments show that 65 mJ/cm2 and above exposure dose can make 50 μm-thickness dry film photoresist exposure fully and obtain the excellent microstructure morphology.The developer with 5% mass concentration has the fastest rate of developing.
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