Abstract:Transition metal silicides represented by MoSi2 have excellent oxidation resistance and are widely used as high-temperature anti-oxidation coatings in hot end components of power equipment. However, the mechanism of temperature-dependent growth of MoSi2 oxidation products has not been revealed. Therefore, this study investigated the formation characteristics of oxide film and silicide-poor compound on MoSi2 at temperatures of 1000-1550°C through high-temperature oxidation experiments, combined with microscopic Raman spectroscopy, SEM, and XRD characterizations. The result showed that MoSi2 underwent high-temperature selective oxidation reactions at 1000-1200°C, forming MoO2 and SiO2 oxide film on the substrate. As the oxidation temperature increased to 1550°C, after 100 hours of oxidation, along with the disappearance of MoO2 and the phase transformation of SiO2, a continuous Mo5Si3 layer with a thickness of approximately 47 μm was formed at the SiO2-MoSi2 interface. Thermodynamics and kinetic calculations further revealed the mechanism of temperature-dependent growth of oxidation products (MoO2 and Mo5Si3) during high-temperature oxidation process of MoSi2. As the temperature increased, the diffusion flux ratio of O and Si decreased, leading to a decrease in oxygen concentration at the interface and promoting the growth of the Mo5Si3 layer. Its thickness is an important indicator for evaluating the oxidation resistance of MoSi2 coatings during service. This study provides experimental and mechanistic insights into the temperature-dependent growth behavior of Mo5Si3 during the high-temperature oxidation of MoSi2 coating, and provides guidance for predicting the service life and improving the oxidation resistance of silicide coatings.

Growth of Single Crystals and Low Temperature Oxidation Behaviors of MoSi2 and NbSi2

A Comparison of the Oxidation Behaviors of Poly-Crystalline and Single Crystalline Nbsi2 at 1023 K

Oxidation of stoichiometric poly- and single-crystalline MoSi2 at 773 K

Microstructural Effect on Oxidation Kinetics of NbSi2 at 1023 K

Oxidation Behaviours of MoSi<sub>2</sub> Single Crystal at the Temperatures of 773K and 1473K

Oxidation Behaviours of MoSi<sub>2</sub> Single Crystal at the Temperatures of 773K and 1473K

Oxidation kinetics and high temperature in-situ observation of the oxidation behaviour of NbSi 2 at 1023 K

(Mo_(0.85)Nb_(0.15))Si_2 Single Phase Single Crystal Prepared by Photothermal Floating Zone Melting Method

In situ observations of the pest oxidation process of NbSi2 at 1023 K

High-temperature Oxidation of Mo-rich (mo1−xnbx)si2 Pseudo-Binary Compounds

Oxidation Response Determined by Multiphase-Dependent Melting Degree of Plasma Sprayed MoSi2 on Nb-based Alloy

Microstructural Characterization and Anti‐Oxidation Properties of Molybdenum Disilicide Coating on Niobium by Spent MoSi 2 ‐Based Materials

Formation and oxidation behavior of refractory high-entropy silicide (NbMoTaW)Si2 coating

Temperature dependence mechanism of high-temperature oxidation of transition metal silicide MoSi2

Effects of Cr-addition and Lamellar Microstructure on the Oxidation Behavior of Single Crystal (Mo0.85nb0.15)si2

Microstructure and high-temperature oxidation resistance of MoSi2-ZrO2 composite coatings for Niobium substrate

Low temperature deformation of MoSi$_2$ and the effect of Ta, Nb and Al as alloying elements

Growth of Crystals and Formation of C40/C11b Lamellar Structure in (Mo0.85nb0.15)si2

Nitridation Behavior of MoSi2 at high temperature

Microstructure and Cyclic Oxidation Behavior of Silicide Coatings Prepared by Molten Salt on Nb–Based Alloys

Investigation of the Oxidation of Mo3Si-Mo5Si3 Eutectic Silicide

Growth of Single Crystals and Low Temperature Oxidation Behaviors of MoSi2 and NbSi2

A Comparison of the Oxidation Behaviors of Poly-Crystalline and Single Crystalline Nbsi2 at 1023 K

Oxidation of stoichiometric poly- and single-crystalline MoSi2 at 773 K

Microstructural Effect on Oxidation Kinetics of NbSi2 at 1023 K

Oxidation Behaviours of MoSi<sub>2</sub> Single Crystal at the Temperatures of 773K and 1473K

Oxidation Behaviours of MoSi&lt;sub&gt;2&lt;/sub&gt; Single Crystal at the Temperatures of 773K and 1473K

Oxidation kinetics and high temperature in-situ observation of the oxidation behaviour of NbSi 2 at 1023 K

(Mo_(0.85)Nb_(0.15))Si_2 Single Phase Single Crystal Prepared by Photothermal Floating Zone Melting Method

In situ observations of the pest oxidation process of NbSi2 at 1023 K

High-temperature Oxidation of Mo-rich (mo1−xnbx)si2 Pseudo-Binary Compounds

Oxidation Response Determined by Multiphase-Dependent Melting Degree of Plasma Sprayed MoSi2 on Nb-based Alloy

Microstructural Characterization and Anti‐Oxidation Properties of Molybdenum Disilicide Coating on Niobium by Spent MoSi 2 ‐Based Materials

Formation and oxidation behavior of refractory high-entropy silicide (NbMoTaW)Si2 coating

Temperature dependence mechanism of high-temperature oxidation of transition metal silicide MoSi2

Effects of Cr-addition and Lamellar Microstructure on the Oxidation Behavior of Single Crystal (Mo0.85nb0.15)si2

Microstructure and high-temperature oxidation resistance of MoSi2-ZrO2 composite coatings for Niobium substrate

Low temperature deformation of MoSi$_2$ and the effect of Ta, Nb and Al as alloying elements

Growth of Crystals and Formation of C40/C11b Lamellar Structure in (Mo0.85nb0.15)si2

Nitridation Behavior of MoSi2 at high temperature

Microstructure and Cyclic Oxidation Behavior of Silicide Coatings Prepared by Molten Salt on Nb–Based Alloys

Investigation of the Oxidation of Mo3Si-Mo5Si3 Eutectic Silicide

Oxidation Behaviours of MoSi<sub>2</sub> Single Crystal at the Temperatures of 773K and 1473K