Method for Accurate Measurement of Micro-Nano Thin Film Device Resistivity

Wu Lei,Ju Bingfeng,Yang Chunhui,Lin Jun
DOI: https://doi.org/10.3969/j.issn.1003-353x.2012.07.017
2012-01-01
Abstract:Because of the width and thickness of the micro-nano thin film is very close to the minimum distance of the electrodes and the position error between electrodes,which led to errors during the measurement process using the four-point-probe.By analyzing the traditional four-point-probe method,a new four-point-probe method model for measurement of micron-nano aluminum thin film's resistivity was created.The four-point-AFM-probe technique was applied for the purpose of quantitatively measuring resistivity of the aluminum film with 400 nm thickness and 30 μm width.The repeatability of resistivity measurements indicates that this new four-point-probe model technique could be used for fast in situ characterization of electrical properties of micro-nano thin film.
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