Preparation and Characterization of Ga2xIn2(1−x)O3 Films Deposited on ZrO2 (100) Substrates by MOCVD

Lingyi Kong,Jin Ma,Fan Yang,Caina Luan,Zhen Zhu
DOI: https://doi.org/10.1016/j.jallcom.2010.02.092
IF: 6.2
2010-01-01
Journal of Alloys and Compounds
Abstract:Ga2xIn2(1−x)O3 films with different gallium (Ga) content x [x=Ga/(Ga+In) atomic ratio] have been deposited on ZrO2 (100) substrates by metalorganic chemical vapor deposition (MOCVD). The structural, electrical and optical properties of obtained films have been studied. Structure analysis revealed that the films deposited with Ga content x=0.1, 0.3 and 0.5 were polycrystalline structures of bixbyite In2O3 and the samples prepared with x=0.7 and 0.9 exhibited amorphous structures. As Ga content x increased from 0.1 to 0.9, the resistivity of the films increased from 2.20×10−3 to 1.90Ωcm and the optical band gap of the films monotonously broadened from 3.72 to 4.46eV. The average transmittance of the samples in the visible range exceeded 78%.
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