Electric field induced interfacial reaction of Au-Ag bimetal film on SiO2 surface

F. X. Shi,L. L. Cao,W. Q. Yao,X. Y. Ye
DOI: https://doi.org/10.1023/A:1004886118489
IF: 4.5
2000-01-01
Journal of Materials Science
Abstract:Interface evolution of nanometer scale Au-Ag bimetal film on SiO 2 substrate surface during electromigration was investigated by angle resolved X-ray photoelectronspectroscopy (ARXPS). ARXPS spectra showed that a chemical reaction between Au-Ag filmand SiO 2 layer occurred at interface, which caused Au, Ag and Si having differentdistribution and chemical states across the film. This result as well as previousobservation by atomic force microscopy (AFM) demonstrate that electromigration of Au-Agbimetal film on SiO 2 surface is accompanied with strong interfacial chemicalreaction rather than a simple lateral physical diffusion process.
What problem does this paper attempt to address?