Synchronization Error Analysis on Step & Scan Lithography

WANG Chunhong,DUAN Guanghong,ZHU Yu
DOI: https://doi.org/10.3969/j.issn.1005-2402.2007.09.015
2007-01-01
Abstract:In the step scan lithography system, the wafer stage and reticle stage should scan simultaneously at a high speed and the speed ratio is 1∶4. The performance of synchronization in lithography is evaluated by MA and MSD. The synchronization error between the wafer and the reticle stages has much effect on the exposure quality of the wafer, such as CD. In this paper, the synchronization error is analyzed. In given scan speed, the relationship between the vibration spectrum and MA/MSD is expounded. The result may be helpful to provide new method to improve MA and MSD.
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