Atomic Self-Diffusion Behaviors Relevant to 2d Homoepitaxy Growth on Stepped Pd(001) Surface
Fusheng Liu,Wangyu Hu,Yifeng Chen,Huiqiu Deng,Han Chen,Xiyuan Yang,Wenhua Luo
DOI: https://doi.org/10.1016/j.susc.2014.01.011
IF: 1.9
2014-01-01
Surface Science
Abstract:Using molecular dynamics, nudged elastic band and modified analytic embedded atom methods, the diffusion behaviors of Pd adatom on stepped Pd(001) surface have been investigated. Lower than 975K, Pd adatom just hops along the perfect [110]-direction step. The diffusion dynamics equation is derived from the Arrhenius law between 875 and 975K, and the corresponding migration energy and prefactor are 0.76eV and 5.2×10−2cm2/s respectively, which shows that they adhere to the step in case of adatom moving to the step. The adatom diffuses across the perfect step with an Ehrlich–Schwoebel barrier of 0.09eV by exchange mechanism. Our calculations show the kink at step can markedly decrease the static energy barrier across the step with a negative Ehrlich–Schwoebel barrier, and it contributes to form layer-by-layer growth model in the epitaxial experiment. Our calculations show that the kink can also markedly improve the adatom's mass transport of interlayer, contributing to the formation of the compact film. Lastly, a quantitative result at 300K shows that the kink affects tremendously the diffusion mobility of adatom near it, which indicates that the kink plays a key role in the formation of the compact and uniform film on Pd(001) surface in an epitaxial growth experiment.