Design for Manufacturability of Deep Sub-Micron Standard Cell Library

LI Ning,WANG Guo-xiong
DOI: https://doi.org/10.3969/j.issn.1003-353X.2007.09.010
2007-01-01
Abstract:New physical design rules were implemented in sub-wavelength lithography circumstance to solve the DFM(design for manufacturability) problems in standard cell library design.New physical design rules were proved which were evaluated by EPE(edge-placement errors) or CD(critical dimensions) tolerances and the area of the cell to have better performance in manufacturability and yield on the beginning of IC design process.Based on the new design rules which will shorten design periods and win competition in the market,a set of DFM-friendly 0.18 μm standard cells were designed.
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