Abstract:Standard cells are essential components of modern digital circuit designs. With process technologies advancing toward 2nm, more routability issues have arisen due to the decreasing number of routing tracks, increasing number and complexity of design rules, and strict patterning rules. The state-of-the-art standard cell design automation framework is able to automatically design standard cell layouts in advanced nodes, but it is still struggling to generate highly competitive Performance-Power-Area (PPA) and routable cell layouts for complex sequential cell designs. Consequently, a novel and efficient methodology incorporating the expertise of experienced human designers to incrementally optimize the PPA of cell layouts is highly necessary and essential. High-quality device clustering, with consideration of netlist topology, diffusion sharing/break and routability in the layouts, can reduce complexity and assist in finding highly competitive PPA, and routable layouts faster. In this paper, we leverage the natural language and reasoning ability of Large Language Model (LLM) to generate high-quality cluster constraints incrementally to optimize the cell layout PPA and debug the routability with ReAct prompting. On a benchmark of sequential standard cells in 2nm, we demonstrate that the proposed method not only achieves up to 19.4% smaller cell area, but also generates 23.5% more LVS/DRC clean cell layouts than previous work. In summary, the proposed method not only successfully reduces cell area by 4.65% on average, but also is able to fix routability in the cell layout designs.

Design for manufacturability of sub-100 nanometer standard cells

Design for Manufacturability of Sub-100 Nanometer Standard Cells

New DFM flow for sub-100 nm standard cells

A new DFM flow for sub-loonm standard cells

Design for Manufacturability of Deep Sub-Micron Standard Cell Library

Design For Manufacturing (DFM) in Nano-CMOS era

A novel layout automation flow to facilitate test chip design for standard cell characterization

A Fast OPC Algorithm for IC Layout Based on 1-D Cells after Optimization of Gap Distribution

A Glance of Technology Efforts for Design-for-manufacturing in Nano-Scale CMOS Processes.

An Automated System for Checking Lithography Friendliness of Standard Cells

Multiple-Lithography-Compliant Verification for Standard Cell Library Development Flow

Methodology for standard cell compliance and detailed placement for triple patterning lithography

Lithography-simulation-based Design for Manufacturability Rule Development: an Integrated Circuit Design House’s Approach

Design for Manufacturability and Reliability in Extreme-Scaling VLSI

Standard Cell Library Evaluation with Multiple lithography-compliant verification and Improved Synopsys Pin Access Checking Utility

Complete DFM Model for High-Performance Computing SoCs with Guard Ring and Dummy Fill Effect

Design of Low-Power High-Performance FinFET Standard Cells

Migrating Standard Cells for Multiple Drive Strengths by Routing Imitation

Impact Study of Layout-Dependent Effects Toward FinFET Combinational Standard Cell Optimization

In Design DFM Rule Scoring and Fixing Method using ICV

Large Language Model (LLM) for Standard Cell Layout Design Optimization