Tungsten disulfide films deposited by magnetron sputtering and their properties

SONG Yu-bo,DAI Ming-jiang,YU Zhi-ming,WEI Chun-bei,HOU Hui-jun,XIAO Xiao-ling
DOI: https://doi.org/10.13385/j.cnki.vacuum.2011.02.006
IF: 4
2011-01-01
Vacuum
Abstract:The WS2 thin films were deposited by twin-target MF magnetron sputtering process at low temperature,and their phase structure,surface micromorphology and tribological properties were investigated via SEM,EDX,XRD,microhardness gauge,scratch tester and ball-on-disc friction/wear test machine.The results showed that the films present obviously the preferential growth of(002) crystal plane and the S/W atomic ratio is 1.52.The friction coefficient of the films can be lower than 0.01 as tested in atmosphere and it goes up with increasing load and rotary speed to a certain extent.
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