Improved thermal model and its application in UV high-power pulsed laser ablation of metal target

Ranran Fang,Duanming Zhang,Zhihua Li,Fengxia Yang,Li Li,Xinyu Tan,Min Sun
DOI: https://doi.org/10.1016/j.ssc.2008.01.002
IF: 1.934
2008-01-01
Solid State Communications
Abstract:An improved thermal model describing UV high-power nanosecond laser ablation of metal target is presented. The vaporization effect, the plasma shielding effect, as well as the absorption coefficient and absorptivity dependence of temperature are considered in this model. Take iron target as an example, the numerical solutions are obtained from the heat flow equations (before and after melting) using a finite difference method. The space and time dependence of temperature of the target, the time dependence of temperature at two different positions for a certain laser fluence, and the ablation rate as a function of laser fluence are also presented. The numerical results that agreed well with the experimental data are much better than the one without, which indicates that the above two effects and the temperature dependence of absorption coefficient and absorptivity in UV high-power laser ablation of metal target should not be neglected. We hope the present model will be useful for further experimental investigation of metal thin films prepared by pulsed laser deposition.
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