A Silicon-Diode-Based Infrared Thermal Detector Array

Yong-Ping Xu,Ruey-Shing Huang,Graham A. Rigby
DOI: https://doi.org/10.1016/0924-4247(93)80039-J
1993-01-01
Abstract:A new silicon-diode-based infrared thermal detector array (1 x 4) has been developed. The silicon diode, as a temperature-sensing device, is built on a thin cantilever structure that is formed by micromachining. The thickness of the cantilever is about 5 mum. A thin layer of bismuth is evaporated on the cantilever as an infrared radiation absorber. With a cantilever measuring 264 mum x 112 mum x 5 mum and an active area measuring 102 mum x 102 mum, the fabricated detector array yields a responsivity of 5.3 V/W, a detectivity of 2.7 x 10(7) cm Hz1/2/W, and a noise equivalent temperature difference (NETD) of 1.7-degrees-C.
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