Surface Uniform Wet Etching of ZnO Films and Influence of Oxygen Annealing on Etching Properties

Tao Zhang,Lei Sun,Dedong Han,Yi Wang,Ruqi Han

DOI: https://doi.org/10.1109/nems.2011.6017433

2011-01-01

Abstract:Wet etchings of ZnO films with HCl, H 3 PO 4 and NH 4 Cl as etchants were systematically studied. The etching morphology and etching rate were focused on and reported in details. The investigation shows that the NH 4 Cl aqueous solution can provide uniform etching rate in the entire regions exposed to the etchant, and the etching rate always changes linearly with NH 4 Cl solution concentrations in a wide range. The etching rate will be stable if a constant concentration is applied. We also took the influence of different annealing conditions on etching properties into accounts. Under a certain annealing condition, the NH 4 Cl aqueous solution still provides uniform etching properties and controllable etching rates. These properties of NH 4 Cl aqueous solution as etchant will bring wide design window to real applications. The above results indicate NH 4 Cl is a promising etchant for ZnO wet etching.