Electrophoresis Deposition of Carbon Nanotubes in MEMS Structures and Their Field Emission Characteristics

GUO Lin-rui,CHEN Feng,YE Xiong-ying,LIU Li-tao,WU Kang,ZHOU Zhao-ying
DOI: https://doi.org/10.3969/j.issn.1004-1699.2006.05.273
2006-01-01
Abstract:To fabricate sensors basing on the field emission of carbon nanotubes (CNTs), electrophoresis deposition (EPD) is introduced to assembly CNT films as field emitters in MEMS structures. Both the SEM characteristics and field emission experiments show that CNT films can be deposited on the certain position in MEMS structures using EPD method. For the emission gap of 4 μm, field emission turn-on voltages are measured about 3.6~4 V and emission current can reach 28 μA under emission voltage about 20 V. Moreover, the "post-MEMS" CNT deposition process has shown advantages of simplicity and less contamination, which means the compatibility with MEMS process.
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