Preparation and Magnetic Properties of Cr-Doped Si-Based Dilute Magnetic Semiconductors

WU Yun,LIAO Lei,WU Muhong,LU Hongbing,LI Jinchai
DOI: https://doi.org/10.3321/j.issn:1671-8836.2008.03.009
2008-01-01
Abstract:The Cr-doped Si-based dilute magnetic semiconductors(DMS) with different magnetic properties were prepared by ion implantation method and annealing in argon(Ar) or hydrogen(H2).D8 advanced X-ray diffraction(XRD),Fourier transformed infrared(FT-IR) spectroscopy and superconducting quantum interference device(SQUID) magnetometer were used to characterize the crystalline structures and the magnetic properties of the samples before and after annealing.The XRD results show that the Cr doped sample is amorphous before annealing and recovers crystalline structure after annealing.The IR analysis indicates that there are Si—H bonds in the sample annealed in H2,revealing that the atom hydrogen can passivate the dangling bond defects in silicon,which increases the long-range interaction between conductive electrons and makes the sample have higher Curie temperature than that of the sample annealed in Ar.However,at the temperature lower than 50 K,the magnetization of the sample annealed in H2 is lower than that annealed in Ar,because some atoms of hydrogen bind up the acceptors in the sample.It is possible to increase the magnetization of the sample annealed in H2 with optimizing the technical conditions.
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