Abstract:Solar cells of p-CIS/n-buffer/ZnO type, where CIS is (CuInS2, CuInSe2 or intermediates, are thin-film-based devices for the future high-efficiency and low-cost photovoltaic devices. As important thin film, the properties of Al-doped ZnO (AZO) directly affect the parameter of the cell, especially for large volume. In the present paper, AZO semiconductor transparent thin film on soda-lime glass was fabricated using cylindrical zinc-aluminum target, which can not only lower the cost of the target but also make the preparation of large area AZO thin film more easily. Using the DC magnet sputtering techniques and rolling target, high utilization efficiency of target was achieved and large area uniform and directional film was realized. An introduction to DC magnet sputtering techniques for large area film fabrication is given. With different measurement methods, such as X-ray diffraction (XRD) and scan electron microscope (SEM), we analyzed large size film's structure, appearance, and electrical and optical characteristics. The XRD spectrum indicated that the AZO film shows well zinc-blende structure with a preferred (002) growth and the c-axis is oriented normal to the substrate plane. The lattice constant is 5.603 9 nm and the mismatch with CdS thin film is only 2 percent. It absolutely satisfied the demand of the GIGS solar cell. The cross-section of the AZO thin film indicates the columnar structure and the surface morphology shows that the crystal size is about 50 nm that is consistent with the result of XRD spectrum. By the optical transmission curve, not only the high transmission rate over 85 percent in the visible spectrum between 400 nm and 700 nm was showed but also the band gap 3.1 eV was estimated. And all these parameters can meet the demand of the large area module of GIGS solar cell. The result is that using alloy target and Ar gas, and controlling the appropriate pressure of oxygen, we can get directional, condensed, uniform, high transmitting rate, low resistance and large size (300 mm x 300 mm) AZO film.

Reactive Sputtering of ZnO:Al Thin Films from Rotatable Dual Metallic Targets

Novel etch process to tune crater size on magnetron sputtered ZnO:Al

Effect of Solution Concentration on Surface Morphology, Optical Properties and Solar Light Response of ZnO Thin Films

Characterization of Surface Morphology and Light Scattering of Transparent Conducting ZnO:Al Films as Front Electrode for Silicon Thin Film Solar Cells

Highly Surface-Textured ZnO:Al Films Fabricated by Controlling the Nucleation and Growth Separately for Solar Cell Applications

Light Scattering by Textured Al-Doped Zinc Oxide Film for Thin Film Silicon Solar Cells Coated on Glass Substrates

The fabrication and application of ZnO:Al thin films in low-frequency inductively coupled plasma fabricated silicon solar cell

Exploring co-sputtering of ZnO:Al and SiO2 for efficient electron-selective contacts on silicon solar cells

Texture surfaces and etching mechanism of ZnO:Al films by a neutral agent for solar cells

The properties of surface textured ZnO:Al films grown in hydrogen atmosphere

Tailoring the Morphology, Optical and Electrical Properties of DC-sputtered ZnO:Al Films by Post Thermal and Plasma Treatments

Superior Texture-Controlled Zno Thin Film Using Electrochemical Deposition

Prepareation of Large Area Al-ZnO Thin Film by DC Magnetron Sputtering

Method for Fabricating Textured High-Haze ZnO:Al Transparent Conduction Oxide Films on Chemically Etched Glass Substrates

Plasma-induced Surface Textures of ZnO:Al Transparent Conductive Films

Development of textured ZnO-coated low-cost glass substrate with very high haze ratio for silicon-based thin film solar cells

Newfangled crater-nanorod/honeycomb-like double-textured ZnO:Al films with enhanced light trapping

Systematic control of carrier concentration and resisitivity in RF sputtered Zinc oxide thin films

Facile bottom-up growth of pyramidally textured ZnO:Al films by combined chemical bathing and DC sputtering deposition

Development of aluminum-doped ZnO films for a-Si:H/μc-Si:H solar cell applications

Highly effective passivation of crystalline silicon surfaces achieved through transparent conductive Al-doped ZnO layers