Surface Morphological Modification of Pt Thin Films Induced by Growth Temperature

SQ Wei,BQ Li,T Fujimoto,I Kojima
DOI: https://doi.org/10.1103/physrevb.58.3605
IF: 3.7
1998-01-01
Physical Review B
Abstract:Grazing-incidence x-ray reflectivity (GIXR), x-ray diffraction, and atomic-force microscopy (AFM) are used to characterize surface structures of Pt thin films grown on ultrasmooth SiO2 substrates. The GIXR spectra of the Pt thin films are found to be strongly dependent on the growth temperature. The surface roughness of the Pt thin films shows a minimum (1.21 nm) at the optimum temperature of 773 K, which is in good agreement with that obtained by the AFM measurements. The surface morphology of the Pt thin film grown at 300 K is three dimensional and has mountainlike islands with smaller grain sizes of 10-20 nm. In contrast, the surface of the Pt thin film grown at 773 K is composed of ridges, troughs, and fiat facets.
What problem does this paper attempt to address?