Fabrication of VO2 Films with Low Transition Temperature for Optical Switching Applications

HC Wang,XJ Yi,Y Li
DOI: https://doi.org/10.1016/j.optcom.2005.07.005
IF: 2.4
2005-01-01
Optics Communications
Abstract:Vanadium dioxide films for optical switching applications have been prepared on Si3N4-film-coated silica substrates by ion beam sputtering from a vanadium metal target in an atmosphere of argon and oxygen and subsequent heat treatment. The as-fabricated VO2 films exhibit a nanocrystalline structure and undergo abrupt changes in electrical and optical properties with an abnormal low transition temperature of 34°C. Using micromachining technology, applications of the films as thermo-optical switches are also demonstrated. The measured average optical isolation for the switches is 15dB with a −2dB insertion loss at a wavelength of 1.55μm.
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