Effect of the Atmospheric Jet Plasma Process Parameters on Physical Polishing

LIU Wei-guo,WANG Xue-chun,XI Ying-xue
DOI: https://doi.org/10.3969/j.issn.1673-9965.2012.08.001
2012-01-01
Abstract:For the realization of the super smooth external optical elements with high accuracy and non-destructive processing,the atmospheric jet plasma torch technology was introduced.The effect of the atmospheric jet plasma torch physical polishing on materiel removal for quartz glass was studied,focusing on the process parameters,such as the jet plasma power,the polishing time and the disposing location of the sample,and the etching rate and the surface roughness as well.The experiment shows that the etching rate of quartz glass is as high as 4.6 nm/min with air as the work gas.At the same time,after polishing quartz surface roughness decreases obviously,while the ion torch power is 420~460 W,distance range is 16~22 mm.The quartz glass surface roughness shows a convergent trend with the increase of polishing time.
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