Study on Photodamage of Mg:Ga:LiNbO3 Crystal Wave-Guide Substrate

XH Zhen,R Wang,WS Xu,YH Xu,LC Zhao
DOI: https://doi.org/10.1016/s0925-3467(02)00023-x
IF: 3.754
2002-01-01
Optical Materials
Abstract:MgO and Ga2O3 were doped in LiNbO3 (LN) to grow Mg:Ga:LN crystals. The OH− absorption spectra and photoredamage resistance threshold of Mg:Ga:LN were measured. The mechanism of the shift of OH− absorption peak was investigated. LN crystal was manufactured into proton transfer wave-guide substrate. By using the holograph method, the photodamage resistance ability of wave-guide substrate was measured. It was found that the photodamage resistance ability of Mg:Ga:LN wave-guide substrate was much higher than that of LN wave-guide substrate.
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