Electronic Stopping Power in Pm、Nd and Sm by H Ion and Electron

董芳芳,张红,程新路
DOI: https://doi.org/10.3969/j.issn.0490-6756.2008.05.042
2008-01-01
Abstract:Electronic stopping power for ions in materials is important to study the interaction between ions and materials. Simultaneously, it is an important parameter for ions implantation modification, ion beam surface analysis and other ion beam technique. In our paper, the radiation damage of Pm、Nd and Sm is investigated from the point of theoretical simulation. The electronic stopping powers for 0~120 keV H ions in materials Pm、Nd and Sm are obtained by using SRIM2003 software, and in theory the penetration depths for electron at different energies are given.
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