Cyanide-free copper electroplating in sulfite/thiosulfate bath

YANG Fang-zu,YU Yuan-yuan,HUANG Ling,YAO Guang-hua,ZHOU Shao-min
2009-01-01
Abstract:A cyanide-free copper electroplating process with sulfite/thiosulfate as reducing and complexing agents,amine compound as complexing agent and cuprous ions as main salt was studied using brass and stainless steel as substrates.The bath composition and operation conditions are CuCl2.2H2O 16.0-21.3 g/L,sulfite/thiosulfate 0.457 mol/L,amine compound 0.76 mol/L,H3BO3 36 g/L,glucose 0.38 mol/L,brightener(organic amine compound) 0.04 mL/L,temperature 40 °C,pH 8(adjusted with KOH),agitation,and current density 0.5-2.0 A/dm2.The effects of temperature,pH,mass concentration of copper ions and volume fraction of brightener on the deposit quality and current efficiency were discussed.The structure and surface morphology of the deposit were characterized by SEM and X-ray diffraction,respectively.The results showed that the current efficiency can reach over 90% by appropriately controlling the conditions.The bath pH should be relatively high in operation,but relatively low during storage.The additive can improve the leveling performance of the bath,lead to the unique formation of(111) and(200) oriented faces of copper deposit,increase the deposit brightness,and make grains smaller,more compact and more uniformly distributed.
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