Arrays of Magnetic Nanoparticles Patterned Via "Dip-Pen" Nanolithography

XG Liu,L Fu,SH Hong,VP Dravid,CA Mirkin
DOI: https://doi.org/10.1002/1521-4095(20020205)14:3<231::aid-adma231>3.0.co;2-r
IF: 29.4
2002-01-01
Advanced Materials
Abstract:A versatile new method for generating magnetic nanostructures with dimensions ranging from several hundred nanometers to sub-100 nm is presented here. The method is based on dip-pen nanolithography and allows precise feature size control by tuning the tip-substrate contact time and the scan speed. The Figure shows an AFM topography image of an array of iron oxide nanodots on a gold substrate.
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