Sub-Micron Structures of Magnetic Materials Fabricated by Laser Holographic Lithography Combined with Ion Beam Etching

Zhang Zijun,Xu Xiangdong,Liu Ying,Qiu Keqiang,Fu Shaojun,Hong Yilin,Guo Yuxian,Xu Pengshou,Cai Jianwang
2008-01-01
Abstract:A novel technique has been successfully developed,in which laser holographic lithography and ion beam etching are combined,to fabricate periodic,sub-micron scale and/or nano-scale structures of highly reflective magnetic materials.Its strengths include easy operation and high controllability.Discussions focused on solutions of the many technical problems,including high reflectivity of the substrates,existing of the vertical standing wave patterns,and the "waist effect" occurred on side walls of the coating patterns.The oxygen reactive etching and the pattern modification of the painting produce well-defined structures.A periodic array with feature sizes of 330nm has been successfully fabricated of the 50nm thick,Co0.9Fe0.1 films,on magnetron sputtered Ta/Co0.9Fe0.1/Ta substrate,by the newly developed technique under its optimized conditions.The hysteresis loops of the patterned films,measured with a highly sensitive superconducting quantum interference device(SQUID),display good magnetic characteristics.
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