Preparation of SiO2-TiO2 Planar Optical Waveguide with Sol-Gel Method

LI Ai-kui,WANG Ze-min,LIU Jia-jun,ZENG Xiao-yan
DOI: https://doi.org/10.3969/j.issn.1002-2082.2008.02.029
2008-01-01
Abstract:SiO2-TiO2 planar optical waveguides were prepared with the sol-gel method.The thermal properties of SiO2/TiO2 solgel were analyzed with differential scanning calorimeter(DSC) and thermo gravimetric analysis(TGA).The morphologies of planar waveguides were characterized by SEM and AFM.The propagation loss of the planar optical waveguide at 1 550 nm was measured.The experimental results demonstrate that the gel thin film with the drying processing at 200 ℃ in 30 min presents the porous structure,and for the unsymmetrical planar waveguide,there is a light flux cut-off thickness for a core layer.When the thickness of SiO2-TiO2 core layer is 0.5 μm,the cladding thickness should be at least 6 μm to prevent 1 550 nm light from propagating into the substrate of monocrystalline silicon.At present,the minimum propagation loss of the planar optical waveguides at 1 550 nm is 0.34 dB/cm.
What problem does this paper attempt to address?