Research Advance of Direct Current Magnetron Sputtering

SHI Yongjing,LONG Siyuan,WANG Jie,PAN Fusheng
DOI: https://doi.org/10.3321/j.issn:1005-023x.2008.01.017
2008-01-01
Abstract:It is an important physical vapor deposition technology that the direct current magnetron sputtering is widely applied in industry product and science research.In this paper,it mainiy discusses that in recent years the di- rect current magnetron sputtering have obtained an important advance in the sputtering mechanism and unbalanced closed field magnetron areas,and reviews the pulsed magnetron and structure zone model of coatings deposited by the closed field unbalance direct current magnetron sputtering.It is an important milestone that the sputtering technology has directly changed from magnetron sputtering to ion plating,and the research of the pulsed magnetron sputtering technology is a significant contribution for deposition insulation coatings of high performance.
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