Abstract:ZnAlO thin films with different Al concentrations were prepared on glass and silicon substrates by Magnetron sputtering in this paper. Scanning electron microscopy (SEM), X-ray diffraction (XRD), spectrometer and other instruments were used to analyze the surface morphology, microstructure, transmittance and Raman spectrum of the films. The results showed that trace Al doping significantly increased the surface morphology and size of ZnAlO thin films; The low doped ZnAlO thin film exhibits a good preferred orientation. As the Al doping concentration increases, the main growth direction of the crystal gradually shifts from (101) to (103), and the grain size decreases with the increase of doping concentration during low doping; When the wavelength of ZnAlO film is less than 330 nm, the transmittance of the film is almost zero; When the wavelength is greater than 350 nm, the transmittance of the thin film decreases with the increase of Al doping concentration, and there is a blue shift trend with the increase of Al concentration. When the wavelength is between 420-900nm, the average transmittance of ZnAlO thin film can reach over 90%, and the transmission performance is good; The ZnAlO thin films all have structural characteristic peaks of wurtzite with a frequency of about 437 cm −1 , and the Raman peak position does not move with the increase of Al concentration.

Structural and optical properties of ZnO films grown on the AAO templates

Microstructure and Optical Properties of ZnO Films Deposited by Radio-frequency Reactive Magnetron Sputtering

Microstructure and Electrical Properties of Al-doped ZnO Thin Films

Study on the structural, optic and electrical properties of transparent conductive ZnO:Al (ZAO) thin films

Structural and Electrical Properties of RF Magnetic Sputtered ZnO:Al(ZAO) Thin Films

Effect of substrate temperature on the structural and optical properties of ZnO and Al-doped ZnO thin films prepared by dc magnetron sputtering

Microstructure and optical properties of ZnAlO films prepared by Magnetron sputtering

Influence of Thickness on Optical and Electrical Properties of ZnO:Al Thin Films by DC-Magnetron Sputtered at Room Temperature

Structural and photoluminescent properties of ZnO films deposited by radio frequency reactive sputtering

The structure and optical characters of the ZnO film grown on GaAs/Al2O3 substrate

Inhomogeneous optoelectronic and microstructure property distribution across the substrate of ZnO:Al films deposited by room temperature magnetron sputtering

Structures and Properties of the Al-Doped Zno Thin Films Prepared by Radio Frequency Magnetron Sputtering

Structural and Optical Properties of Al-Doped Zno Films Coated by Rf Magnetron Sputtering

Structural, electrical and optical properties of Gd doped and undoped ZnO:Al (ZAO) thin films prepared by RF magnetron sputtering

Preparation and characterization of high-performance direct current magnetron sputtered ZnO:Al films

Structural and Optical Properties of Zno Films Grown on R-Al2o3 Substrates

Preparation of highly transparent conductive Al-doped ZnO thin films and annealing effects on properties

RF Magnetron Sputtering Process and Photoelectric Property of A1 Doped ZnO Films

Preparation and Character of Textured ZnO:Al Thin Films Deposited on Flexible Substrates by RF Magnetron Sputtering

Preparation of ZAO film by low-temperature hydrothermal approach and its electrical property

The properties of Al doped ZnO thin films deposited on various substrate materials by RF magnetron sputtering