Abstract:For applications in the field of optoelectronics, zinc oxide (ZnO) based transparent conducting oxide thin films such as aluminium-doped zinc oxide (AZO) have recently received much attention. It is one of the most promising alternative materials to the widely used indium tin oxide (ITO or tin-doped indium oxide) and fluorine-doped tin oxide (FTO). In this work, the ZnO and AZO base thin films were prepared by radio frequency (rf) magnetron sputtering technique using ZnO and AZO (1at%Al) ceramic target. The Ga interlayer films, added in between base thin films (ZnO and AZO), were deposited by evaporation technique. Both ZnO/Ga/ZnO and AZO/Ga/AZO multilayer thin film structures were grown on glass substrates. Then the obtained multilayer structures were annealed in argon (Ar) ambient at 400°C for 1 hr. The morphology, qualitative and quantitative elemental analysis, crystal structure, electrical properties, and optical properties of the multilayer thin films were characterized by field emission scanning electron microscope (FE-SEM), energy dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD), a four-point probe method and UV-Vis spectroscopy. The results revealed that after annealing treatment, the average transmittance of the both multilayer thin films in visible region was improved due to a decrease in surface roughness resulting in an increase in crystalline surface. Furthermore, the results revealed lower sheet resistance in the AZO/Ga/AZO relative to pure ZnO multilayer base thin films. The significance of the electrical properties of the AZO/Ga/AZO films can be achieved due to local structure of Al site in ZnO and partial diffusion of Ga atoms into the base thin film layers. This indicates that the Ga interlayer in both ZnO/Ga/ZnO and AZO/Ga/AZO multilayer thin films can be used to further improve electrical conductivity without degrading optical transmission.

Deposition of Ni, Ag, and Pt-based Al-doped ZnO Double Films for the Transparent Conductive Electrodes by RF Magnetron Sputtering

Deposition and Characterization of AZO Thin Films on Flexible Glass Substrates Using DC Magnetron Sputtering Technique

Fabrication and Properties of Transparent Conductive AZO/Cu Bilayer Films

Effect of Film Thickness on Properties of Al-Doped Zno Film As Transparent Conducting Electrodes in Oleds

Investigation on Transparent, Conductive ZnO:Al Films Deposited by Atomic Layer Deposition Process

Transparent conductive Al-doped ZnO/Cu bilayer films grown on polymer substrates at room temperature

Transparent conductive and near-infrared reflective Cu-based Al-doped ZnO multilayer films grown by magnetron sputtering at room temperature

Highly Surface-Textured ZnO:Al Films Fabricated by Controlling the Nucleation and Growth Separately for Solar Cell Applications

Effects of deposition power and pressure on the crystallinity of Al-doped ZnO thin films at glass substrates by low temperature RF magnetron sputtering

A Comprehensive Investigation of the Mechanical and Tribological Properties of AZO Transparent Conducting Oxide Thin Films Deposited by Medium Frequency Magnetron Sputtering

AlN∶Mg/ZnO∶Al Hetero-Junction by Magnetron Sputtering and Their Optoelectrical Characteristics

Deposition of Aluminum Doped Zno As Electrode for Transparent Zno/Glass Surface Acoustic Wave Devices

High Performance AZO Thin Films Deposited by RF Magnetron Sputtering at Low Temperature

Ga, Mg, F ternary-doped ZnO-based transparent conductive film prepared by radio-frequency sputtering with high transmittance

Research on Preparation and Properties of Transparent Conductive ZnO:Al Thin films

Enhanced Performance in Al-Doped ZnO Based Transparent Flexible Transparent Thin-Film Transistors Due to Oxygen Vacancy in ZnO Film with Zn-Al-O Interfaces Fabricated by Atomic Layer Deposition.

Effect of Gallium Interlayer in ZnO and Al-doped ZnO Thin Films

Transparent Conductive Al-Doped Zno Thin Films Grown at Room Temperature

Synthesis of ZnO:Al Transparent Conductive Thin Films Using Sol-gel Method

Room Temperature Sputtered Aluminum-Doped ZnO Thin Film Transparent Electrode for Application in Solar Cells and for Low-Band-Gap Optoelectronic Devices

Micrographs and Optical Properties of Al-Doped Zno Thin Films Deposited by Radio Frequency Magnetron Sputtering