Low Temperature ITO Film Growth by Plasma Assisted Deposition

Zhang Tianwei,Yang Huisheng,Luo Qinghong,Wang Yanbin,Lu Yonghao
DOI: https://doi.org/10.13922/j.cnki.cjovst.2008.s1.017
2008-01-01
Abstract:The indium tin oxides(ITO)coatings were grown by plasma assisted deposition at room temperature on water-cooled polyethylene terephthalate(PET)substrates.The morphology and properties of the ITO films were characterized with X-ray diffraction(XRD),X-ray photoelectron spectroscopy(XPS)and scanning electron microscopy(SEM).The influence of the film growth conditions on its microstructures and its properties was studied.The results show that high quality polycrystalline ITO films with crystal grains can be deposited with the technique under optimized growth conditions.The lowest resistivity of the ITO film on PET substrate was found to be 1.1 ×10-3 Ω·cm.
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