EBSD Analysis of Local Elastic Strain Fields in Semiconductor Structures

LUO Jun-feng,WANG Jun-zhong,NIU Nan-hui,ZHAO Lin-lin,ZHANG Yin-qi,GUO Xia,SHEN Guang-di,JI Yuan
DOI: https://doi.org/10.3969/j.issn.1000-6281.2006.02.004
2006-01-01
Abstract:The elastic strain regions of the boron-doped silicon free-handing Si diaphragm and the heteroepitaxial GaN layer grown on the sapphire substrate of a LED were measured by electron backscattering diffraction(EBSD).The strain sensitive parameters as Image qualities(IQ),the Hough transforms of the Kikuchi lines,as well as the small angle misorientation were used to evaluate the lattice distortion and the local elastic strain fields of the single crystals system at micron to submicron regions.The elastic stress distribution of the window region of the Si-membrane and the GaN epilayers in LED were obtained by EBSD.
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