An improved method for test chip design

PAN Wei-wei,ZHANG Bo,ZHENG Yong-jun,SHI Zheng,YAN Xiao-lang
2013-01-01
Abstract:The rapid development of IC manufacturing technology poses huge challenges to localize an electrical defect to a specific area on the IC.Either traditional or existing addressable design methods of test chip fail to fulfill the current requirements for fast and accurate defect localization.In this paper,we present an improved method for addressable test chip design.For electrical testing of test chip,four-terminal connection of each test structure and single NMOS transistor as switch are used to improve measurement accuracy,peripheral circuits design simplicity as well as area efficiency.For defect localization,only a small amount of pads are added and used together with switches to localize physical faults.This method is used in a 110nm CMOS technology and verified by the silicon results,which shows several real defects(metal open,etc) are localized to help determine the physical root causes and realize a rapid yield improvement.
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